有機無機復合ZrO2-SiO2平面光波導

采用溶膠凝膠法合成ZrO2-SiO2 有機無機復合光波導材料,通過改變其中ZrO2 的含量來調節材料的折射率,使材料分別適用于平面光波導的導光層( ng≈1. 497) 和襯底層、包層( nb = nc≈1. 479) 。采用旋轉涂膜工藝和相應的熱處理,在單晶硅基片上制備襯底層、導光層和包層等薄膜,其中導光層介質因具有感光性而可通過紫外光刻來制備光路圖案。所得有機無機復合ZrO2-SiO2 板型平面光波導(襯底層+ 導光層) ,用棱鏡耦合截斷法測試其光損耗在632. 8 nm 波長處約為0. 8 dB/ cm。對板型平面波導的導光層薄膜進行紫外光刻和異丙醇淋洗,制備出脊狀光波導通道,在覆蓋包層后,即獲得埋層溝道式平面光波導。采用端耦合截斷法測試了埋層溝道式平面光波導的光損耗(小于0. 1dB/ cm) ,并觀察了其近場圖像以及導光材料在近紅外窗口的吸收光譜。

ZrO2-SiO2 organic2inorganic hybrid optical waveguide mate rials we re synthesised by the sol2gel p rocess .Ref ractive index of the hybrid films was adjusted with diffe rent amounts of ZrO2 for the use as guiding laye rs( ref ractive index ng≈1. 497) , buffer laters and clading laye rs ( nb = nc≈1. 479) . The hybrid films were depositedon single2crys tal silicon wafe rs ( <≈10 cm) by sol2gel spin2coating. The guiding layers were UV2photosensitive and so UV2pat te rnable . Optical p ropagation loss in the slab waveguides was measured to be about 0. 8 dB/ cm at 632. 8 nm ,by the cut2back method , using p rism2coupling. The buried channel waveguides we re also p repared by pat ternning the guiding layers of the slab waveguides with UV2curing and rinsing with isop ropanol . Propagation loss in the buried channel waveguides was also measured by the cut2back method , using but t2coupling. The loss was lowe r than the measurement e r ror , or less then 0. 1 dB/ cm at 632. 8 nm. The near2field pat terns were obse rved , and absorption spect rum of the hybrid material for the guiding layers was measured.